Course syllabus adopted 2021-02-26 by Head of Programme (or corresponding).
Overview
- Swedish nameGrunderna i mikro- och nanoteknologi
- CodeFKA196
- Credits7.5 Credits
- OwnerMPNAT
- Education cycleSecond-cycle
- Main field of studyElectrical Engineering, Engineering Physics
- DepartmentMICROTECHNOLOGY AND NANOSCIENCE
- GradingTH - Pass with distinction (5), Pass with credit (4), Pass (3), Fail
Course round 1
- Teaching language English
- Application code 18114
- Maximum participants90 (at least 10% of the seats are reserved for exchange students)
- Block schedule
- Open for exchange studentsYes
Credit distribution
Module | Sp1 | Sp2 | Sp3 | Sp4 | Summer | Not Sp | Examination dates |
|---|---|---|---|---|---|---|---|
| 0106 Examination 7.5 c Grading: TH | 7.5 c | 0 c | 0 c | 0 c | 0 c | 0 c |
|
In programmes
- MPAEM - MATERIALS ENGINEERING, MSC PROGR, Year 2 (elective)
- MPEES - EMBEDDED ELECTRONIC SYSTEM DESIGN, MSC PROGR, Year 2 (elective)
- MPNAT - NANOTECHNOLOGY, MSC PROGR, Year 1 (compulsory)
- MPPHS - PHYSICS, MSC PROGR, Year 1 (compulsory elective)
- MPPHS - PHYSICS, MSC PROGR, Year 2 (elective)
- MPWPS - WIRELESS, PHOTONICS AND SPACE ENGINEERING, MSC PROGR, Year 2 (elective)
Examiner
Avgust Yurgens- Masterprogramansvarig, Physics, Chemistry and Biological Engineering along with Mathematics and Engineering Preparatory Year
Eligibility
General entry requirements for Master's level (second cycle)Applicants enrolled in a programme at Chalmers where the course is included in the study programme are exempted from fulfilling the requirements above.
Specific entry requirements
English 6 (or by other approved means with the equivalent proficiency level)Applicants enrolled in a programme at Chalmers where the course is included in the study programme are exempted from fulfilling the requirements above.
Course specific prerequisites
University-level of General Physics and Mathematics.
Aim
Microelectronics has had tremendous development during the last ten years broadening the field of applications in many directions. The industry is constantly pushing the critical device dimensions down to the nanometer scale. This is not possible without development of the material science and nano-processing technology. A great many sophisticated instruments and techniques built up to make and characterize micro- and nano-scale devices have already become indispensable in virtually every research area and high-tech industry. There are numerous and growing novel applications in telecommunication, safety, photonics, optoelectronics, energy harvesting, micro-fluidics, sensors, information storage, etc. that demand reliable nano-processing techniques and tools. Further progress requires a continuous search for new materials (e.g. graphene), new physical principles of operation (e.g. spintronics) and advanced methods of fabrication, processing and characterization of nano-devices (e.g. focused-ion milling, x-ray- and near-field lithography). The course aims at giving a basic knowledge of modern micro- and nano-scale processing (pattern transfer by different lithography techniques; the plasma-, thermal-, and chemical processes for etching and modification of materials; thin film deposition methods), as well as characterization techniques for assessing the resulting materials- and device properties. Also, a few examples of basic processing steps for fabrication of CMOS-transistors, light-emitting diodes, lasers, micro-electromechanical systems and microfluidic devices will be described. Laboratory exercises in the clean room of the Microtechnology Centre at Chalmers (MC2) will demonstrate how the nano-scale fabrication equipment functions in reality.Learning outcomes (after completion of the course the student should be able to)
- describe and arrange material-science aspects and physical principles of nano-scale technology
- examine and illustrate the link between processing, material structure, resulting properties, and performance of the devices
- select proper materials, deposition, and characterization techniques for a given task
- describe and assess advantages and limitations of different lithography- and thin-film deposition techniques
- overview the development- and describe the most recent trends in nano-scale technology
- present a critical summary of one of the novel and promising nano- fabrication techniques or devices at a student conference
- tell the general rules and safety procedures for working in the clean-room environment and with hazardous chemicals.
The course provides a basis for further studies at the undergraduate and postgraduate level, diploma work, and professional preparation in the field of nanotechnology.
Content
The core of the course is dedicated to the theory and practice of micro- and nano-fabrication techniques, one of the most important constituents of modern Nanoscale Technology. Modern pattern transfer techniques like e-beam- or x-ray lithography and various thin film deposition methods including thermal-evaporation, sputtering, chemical-vapor deposition, and epitaxy are covered in this course, with their physical- and chemical backgrounds shortly mentioned. Film formation, its structure and methods of characterization are explained, with particular emphasis on correlation between the deposition parameters and resulting material properties. During the lectures students also learn the vacuum systems including system operation and design, and the physical processes in gases. Also, a few practical devices like CMOS-transistors or light-emitting diodes are considered in more details.Organisation
This course includes lectures, several demonstrations, and a literature project. A number of quizzes are given to deepen the knowledge obtained during the lectures and to prepare for the quiz-based exam.Literature
"Introduction to Microfabrication" by Sami Fransilla (ISBN 978-0-470-74983-8, Wiley). This is available as E-book at Chalmers Library. Lecture PPT will be available in Ping Pong close to lecture date..
2 other books that can be used as reference material; "Introduction to Microelectronic Fabrication" by R.C. Jaeger (Pearson Edu Ltd, London, ISBN 0-201-44494-7) and "The Materials Science of Thin Films" by M. Ohring (ISBN: 012524990x, 1992 (ISBN 0125249756) .
"Introduction to Microelectronic Fabrication" by R.C. Jaeger (Pearson Edu. Ltd., London; ISBN 0-201-44494-7). Also, "The Materials Science of Thin Films" by M. Ohring (ISBN: 012524990x; 1992) is available as an e-book free of charge through Chalmers library. Second edition (ISBN 0125249756) can be used as well. Moreover, lecture notes will be delivered electronically before the corresponding lectures.
Examination including compulsory elements
Quiz-based written examination usually containing 120-130 quiz questions (70%). 20% will be given for doing homework assignments. The last 10% will be given for making a literature project and participation in the lab demonstrations.The course examiner may assess individual students in other ways than what is stated above if there are special reasons for doing so, for example if a student has a decision from Chalmers on educational support due to disability.